Electrical characterization of rapidly annealed Ni and Pd/n-InP Schottky diodes

Published under licence by IOP Publishing Ltd
, , Citation G Eftekhari 1995 Semicond. Sci. Technol. 10 1163 DOI 10.1088/0268-1242/10/8/020

0268-1242/10/8/1163

Abstract

The effects of rapid thermal annealing on the electrical characteristics of Ni and Pd contacts on n-InP are investigated. Results show that annealing at temperatures up to 450 degrees C and for durations up to 100 s has little effect on the electrical parameters of these contacts. Contacts annealed at 600 degrees C showed some degradation. Contacts annealed at 450 degrees C and 600 degrees C for 100 s showed an aging effect. Different reaction processes at the interface and formation of an InP surface layer with no stoichiometry are used to explain the observations.

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10.1088/0268-1242/10/8/020