Self-patterning of arrays of ferroelectric capacitors: description by theory of substrate mediated strain interactions

Self-patterning presents an appealing alternative to lithography for the production of arrays of nanoscale ferroelectric capacitors for use in high density non-volatile memory devices. However current levels of registration achieved experimentally are far from adequate for this application. To provide a guide for experiment we have applied the theories developed for self-patterning of semiconductor nanocrystals to two self-patterning systems of potential interest for ferroelectric memory applications, metallic bismuth oxide on bismuth titanate and ferroelectric lead zirconate titanate on strontium titanate.