Microhardness of Ti-N films containing the epsilon -Ti2N phase

V Poulek; J Musil; V Valvoda; R Cerny

doi:10.1088/0022-3727/21/11/020

Journal of Physics D: Applied Physics

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Microhardness of Ti-N films containing the epsilon -Ti₂N phase

V Poulek¹, J Musil¹, V Valvoda¹ and R Cerny¹

Published under licence by IOP Publishing Ltd
Journal of Physics D: Applied Physics, Volume 21, Number 11 Citation V Poulek et al 1988 J. Phys. D: Appl. Phys. 21 1657 DOI 10.1088/0022-3727/21/11/020

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¹ Inst. of Phys., Czechoslovak Acad. of Sci., Prague, Czechoslovakia

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Abstract

The microhardness of three sets of Ti-N films containing the epsilon -Ti₂N phase is investigated. Experiments show that Ti-N films with highest microhardness do not have to contain the epsilon -Ti₂N phase, as has usually been reported previously. The hardest films always contain the delta -TiN_x phase only.

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