A dual-phase-lag diffusion model for predicting thin film growth

A dual-phase-lag diffusion (DPLD) model, which extends Fick's law by including two lagging times, _j for the mass flux vector and for the density gradient, is developed to predict thin film growth. Depending upon the phase lag ratio / _j , the DPLD model uniquely characterizes four types of growth kinetics as reported in the literature. The model validation with experimental data of silicon oxidation and Hg_1-x Cd_x Te film deposition demonstrates that the present model captures the anomalous behaviour of thin film growth from the very beginning of the process to relatively long times very well.