Copper tin sulfide semiconductor thin films produced by heating SnS–CuS layers deposited from chemical bath

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Published 1 July 2003 Published under licence by IOP Publishing Ltd
, , Citation M T S Nair et al 2003 Semicond. Sci. Technol. 18 755 DOI 10.1088/0268-1242/18/8/306

0268-1242/18/8/755

Abstract

Copper tin sulfide (Cu4SnS4) thin films have been prepared by heating a layer of CuS thin film deposited over an SnS thin film, both obtained by chemical bath deposition. Upon heating in a nitrogen atmosphere at 300–340 °C, the CuS layer converts to Cu8S5, which reacts with the underlying SnS thin film at about 400 °C to form Cu4SnS4. The optical band gap of Cu4SnS4 has been found to be approximately 1 eV, involving direct forbidden transitions. The films are photosensitive, and the electrical conductivity in the dark is about 1 Ω−1 cm−1.

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10.1088/0268-1242/18/8/306