Dynamic behavior of the abrupt crystalline-to-amorphous (c-a) transition in the ion-implantation process and the amorphous-to-crystalline (a-c) transition in Q-switched neodymiun-doped yttrium aluminum garnet laser annealing are studied by use of light scattering. Excess internal energy and excess configurational entropy required for the abrupt c-a transition are invoked to calculate the threshold fluence of implanted species. It is observed that the threshold power density of pulse-laser annealing for recrystallization depends strongly upon the coupling of light to a given thickness of implanted silicon.

• Received 20 October 1986

DOI:https://doi.org/10.1103/PhysRevB.35.9240