Promotion of the Si(100)-O2 reaction by Sm

J. Onsgaard, J. Ghijsen, R. L. Johnson, M. Christiansen, F. O/rskov, and P. J. Godowski
Phys. Rev. B 43, 4216 – Published 15 February 1991
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Abstract

It is demonstrated that ultrathin and thin films of Sm on Si (100) strongly promote the oxidation of Si. Photoemission measurements of the Si 2p core electrons show binding-energy shifts characteristic of Si2O3 and SiO2. The oxygen binding is conditioned by the presence of Sm, which is also oxidized. Reflection electron-energy-loss spectra and valence-band photoemission data indicate formation of an insulator with a valence-band maximum 4 eV below the Fermi level. The influences of samarium coverages, in the 1–20-monolayer regime, and of the temperature on the reaction are studied.

  • Received 2 July 1990

DOI:https://doi.org/10.1103/PhysRevB.43.4216

©1991 American Physical Society

Authors & Affiliations

J. Onsgaard

  • Fysisk Institut, Odense University, DK-5230 Odense M, Denmark

J. Ghijsen

  • Department of Solid State and Applied Physics, University of Groningen, The Netherlands

R. L. Johnson

  • II. Institut für Experimental Physik, Universität Hamburg, D-2000 Hamburg 50, Federal Republic of Germany

M. Christiansen, F. O/rskov, and P. J. Godowski

  • Fysisk Institut, Odense University, DK-5230 Odense M, Denmark

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Vol. 43, Iss. 5 — 15 February 1991

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