First-principles calculations for charged states of hydrogen atoms in SiO2

Ayumi Yokozawa and Yoshiyuki Miyamoto
Phys. Rev. B 55, 13783 – Published 15 May 1997
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Abstract

Charged states of H atoms in defect-free SiO2 have been proposed from first-principles total-energy band-structure calculations within a framework of the local-density approximation. The polarities of the charged states are determined depending on the position of the Fermi level. A positively charged state forms an Si-(OH+)-Si complex, while a negatively charged state forms an Si-H bond. Calculated vibrational frequencies of newly formed O-H+ and Si-H bonds for each charge state are found to be lower than those for neutral O-H and Si-H bonds, so the H-originated charge traps are expected to be distinguishable by either Raman or infrared spectroscopies.

    DOI:https://doi.org/10.1103/PhysRevB.55.13783

    ©1997 American Physical Society

    Authors & Affiliations

    Ayumi Yokozawa

    • ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, 229 Japan

    Yoshiyuki Miyamoto

    • Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, 305 Japan

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    Issue

    Vol. 55, Iss. 20 — 15 May 1997

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