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DX-behavior of Si in AlN

R. Zeisel, M. W. Bayerl, S. T. B. Goennenwein, R. Dimitrov, O. Ambacher, M. S. Brandt, and M. Stutzmann
Phys. Rev. B 61, R16283(R) – Published 15 June 2000
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Abstract

In Si doped AlN, a large persistent photoconductivity is found for temperatures below 60 K after exposure to light with photon energies above 1.5 eV. Simultaneously, a persistent electron spin resonance signal is observed with an isotropic g factor of 1.9885 due to an effective mass donor state, while no spin resonance signal is detectable after cooling the sample in the dark. Both observations show that Si undergoes a DX-like metastability in this material. Based on the experimental findings, a detailed configuration diagram is proposed.

  • Received 22 March 2000

DOI:https://doi.org/10.1103/PhysRevB.61.R16283

©2000 American Physical Society

Authors & Affiliations

R. Zeisel*, M. W. Bayerl, S. T. B. Goennenwein, R. Dimitrov, O. Ambacher, M. S. Brandt, and M. Stutzmann

  • Walter Schottky Institut, Technische Universität München, Am Coulombwall, D-85748 Garching, Germany

  • *Electronic mail: zeisel@wsi.tum.de

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Vol. 61, Iss. 24 — 15 June 2000

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