Hole-doping effect on the thermoelectric properties and electronic structure of CoSi

C. S. Lue, Y.-K. Kuo, C. L. Huang, and W. J. Lai
Phys. Rev. B 69, 125111 – Published 23 March 2004
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Abstract

We report the effect of Al substitution on the temperature-dependent electrical resistivity, Seebeck coefficient, as well as thermal conductivity in the binary compound cobalt monosilicide. It is found that the substitution of Al onto the Si sites causes a dramatic decrease in the electrical resistivity and lattice thermal conductivity. A theoretical analysis indicated that the reduction of lattice thermal conductivity arises mainly from point-defect scattering of the phonons. For x>~0.05 in the CoSi1xAlx system, the Seebeck coefficient changes sign from negative to positive, accompanied by the appearance of a broad maximum. These features are associated with the change in the electronic band structure, where the Fermi level shifts downwards from the center of the pseudogap due to hole-doping effect. While the thermoelectric performance improves with increasing Al substitution, the largest figure-of-merit ZT value among these alloys is still an order of magnitude lower than the conventional thermoelectric materials.

  • Received 3 December 2003

DOI:https://doi.org/10.1103/PhysRevB.69.125111

©2004 American Physical Society

Authors & Affiliations

C. S. Lue1,*, Y.-K. Kuo2,†, C. L. Huang1, and W. J. Lai1

  • 1Department of Physics, National Cheng Kung University, Tainan 70101, Taiwan
  • 2Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan

  • *Electronic address: cslue@mail.ncku.edu.tw
  • Electronic address: ykkuo@mail.ndhu.edu.tw

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Vol. 69, Iss. 12 — 15 March 2004

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