Excitons in Si nanocrystals: Confinement and migration effects

Johannes Heitmann, Frank Müller, Lixin Yi, Margit Zacharias, Dmitri Kovalev, and Frank Eichhorn
Phys. Rev. B 69, 195309 – Published 21 May 2004
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Abstract

A detailed analysis of the strong room-temperature photoluminescence (PL) signal of size controlled nc-Si is reported. The size control of nc-Si is realized by evaporation of SiO/SiO2 superlattices and subsequent thermally induced phase separation. By this method the synthesis of completely SiO2 passivated Si nanocrystals with a controlled size is demonstrated. A strong blueshift of the photoluminescence signal from 1.3 to 1.65 eV with decreasing crystal size is observed. Resonant photoluminescence measurements prove the breakdown of the k-conservation rule for nc-Si by showing an increase in the no-phonon transition probability with decreasing crystal size. A no-phonon to phonon assisted transition probability ratio above 1 is detected at 4.5 K. These results confirm quantum confinement as the origin of the investigated luminescence signal. The size dependence of the different luminescence properties and the very high no-phonon transition probability indicate a lower confinement barrier compared to other systems containing nc-Si and additional migration effects of the excitons between the nanocrystals. A separation of quantum confinement and migration effects on the PL signal is possible due to the very narrow size distribution of the nc-Si and detailed time and temperature dependent investigations of the photoluminescence.

  • Received 27 January 2004

DOI:https://doi.org/10.1103/PhysRevB.69.195309

©2004 American Physical Society

Authors & Affiliations

Johannes Heitmann*, Frank Müller, Lixin Yi, and Margit Zacharias

  • Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle, Germany

Dmitri Kovalev

  • Technische Universität München, Physik, Department E16, 85747 Garching, Germany

Frank Eichhorn

  • Forschungszentrum Rossendorf, Institut für Ionenstrahlphysik und Materialforschung, P.O. Box 510119, 01314 Dresden, Germany

  • *Present address: Memory Development Center, Infineon Technologies Corporation, Königsbrücker Strasse 180, D-01099 Dresden, Germany.
  • Corresponding author. Electronic address: zacharia@mpi-halle.de

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Issue

Vol. 69, Iss. 19 — 15 May 2004

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