Strain-engineered photoluminescence of silicon nanoclusters

X.-H. Peng, S. Ganti, A. Alizadeh, P. Sharma, S. K. Kumar, and S. K. Nayak
Phys. Rev. B 74, 035339 – Published 27 July 2006

Abstract

Density functional calculations on silicon clusters show that strain effects on the band gap display qualitatively new trends for dots smaller than 2nm. While the bulk indirect band gap increases linearly with increasing strain, this trend is reversed for small clusters (1nm). In the intermediate 12nm size range, strain appears to have almost no effect. These results follow from the fact that the bonding/antibonding character of the HOMO and the LUMO change nonmonotonically with size. Since the strain level of the surface atoms dominate this behavior, they strongly stress the role of surface passivation on experimentally measured band gaps.

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  • Received 22 May 2006

DOI:https://doi.org/10.1103/PhysRevB.74.035339

©2006 American Physical Society

Authors & Affiliations

X.-H. Peng1,2, S. Ganti2, A. Alizadeh2, P. Sharma3, S. K. Kumar4, and S. K. Nayak1

  • 1Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA
  • 2General Electric Global Research Center, Niskayuna, New York 12309, USA
  • 3Department of Mechanical Engineering, Department of Physics, University of Houston, Houston, Texas 77204, USA
  • 4Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA

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Issue

Vol. 74, Iss. 3 — 15 July 2006

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