Abstract
The doping of hydrogenated amorphous silicon is discussed within the context of Mott's rule, and found to have properties distinctly different from dopants in crystalline silicon. A unifying description of dopant and defect states based on the position of the Fermi energy is given. Some possible consequences of the rule for the deposition and structure of -Si: H are also discussed.
- Received 23 August 1982
DOI:https://doi.org/10.1103/PhysRevLett.49.1187
©1982 American Physical Society