Thermal diffuse x-ray-scattering studies of the water-vapor interface

D. K. Schwartz, M. L. Schlossman, E. H. Kawamoto, G. J. Kellogg, P. S. Pershan, and B. M. Ocko
Phys. Rev. A 41, 5687 – Published 1 May 1990
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Abstract

Agreement between the theoretical and measured resolution dependence of x-ray specular reflection from the H2O-vapor interface shows that the macroscopic capillary model for surface roughness can be extended to length scales as small as 400 Å. Agreement between measured thermal diffuse scattering data and the theoretical form, with no significant adjustable parameters, independently leads to similar conclusions.

  • Received 8 December 1989

DOI:https://doi.org/10.1103/PhysRevA.41.5687

©1990 American Physical Society

Authors & Affiliations

D. K. Schwartz, M. L. Schlossman, E. H. Kawamoto, G. J. Kellogg, and P. S. Pershan

  • Department of Physics and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138

B. M. Ocko

  • Department of Physics, Brookhaven National Laboratory, Upton, New York 11973

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Vol. 41, Iss. 10 — May 1990

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