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Direct evidence of stress-induced site change of H in V observed by the channeling method

Eiichi Yagi, Takane Kobayashi, Shiho Nakamura, Fumihisa Kano, Kenji Watanabe, Yuh Fukai, and Shigetoshi Koike
Phys. Rev. B 33, 5121(R) – Published 1 April 1986
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Abstract

The effect of external stress on the lattice location of H in α-VH0.0100.015 was investigated at room temperature by the channeling method using the reaction H1(11B, α)αα. A drastic site change of H from T sites to the displaced-T or 4T configuration was observed when a compressive stress of 7 kg/mm2 (below the elastic limit) was applied along the 〈100〉 direction. With the release of the stress, the H atoms returned to the T sites. The observed stress-induced configuration is believed to be closely connected to the occurrence of an enormous enhancement of diffusivity of H in V under stress.

  • Received 7 October 1985

DOI:https://doi.org/10.1103/PhysRevB.33.5121

©1986 American Physical Society

Authors & Affiliations

Eiichi Yagi, Takane Kobayashi, Shiho Nakamura, and Fumihisa Kano

  • The Institute of Physical and Chemical Research, Wako-shi, Saitama 351-01, Japan

Kenji Watanabe and Yuh Fukai

  • Department of Physics, Chuo University, Kasuga, Bunkyo-ku, Tokyo 112, Japan

Shigetoshi Koike

  • Department of Physics, Science University of Tokyo, Kagurazaka, Shinjuku-ku, Tokyo 162, Japan

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Issue

Vol. 33, Iss. 7 — 1 April 1986

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