Island-size scaling in surface deposition processes

M. C. Bartelt, M. C. Tringides, and J. W. Evans
Phys. Rev. B 47, 13891 – Published 15 May 1993
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Abstract

Diffusion-mediated nucleation and growth of islands during deposition occurs essentially irreversibly in a variety of systems. We provide a scaling theory for the full island-size distribution, both with the ratio of surface diffusion to deposition rates and with time. Scaling functions and exponents are determined by simulation and explained analytically by an unconventional rate-equation analysis. Experimental tests for theoretical predictions are discussed, including the scaling of superlattice beam profiles for diffraction studies of heteroepitaxial systems.

  • Received 24 July 1992

DOI:https://doi.org/10.1103/PhysRevB.47.13891

©1993 American Physical Society

Authors & Affiliations

M. C. Bartelt

  • Institute for Physical Research and Technology, Iowa State University, Ames, Iowa 50011

M. C. Tringides

  • Ames Laboratory and Department of Physics, Iowa State University, Ames, Iowa 50011

J. W. Evans

  • Department of Mathematics and Ames Laboratory, Iowa State University, Ames, Iowa 50011

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Vol. 47, Iss. 20 — 15 May 1993

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