Oxides on GaAs and InAs surfaces: An x-ray-photoelectron-spectroscopy study of reference compounds and thin oxide layers

G. Hollinger, R. Skheyta-Kabbani, and M. Gendry
Phys. Rev. B 49, 11159 – Published 15 April 1994
PDFExport Citation

Abstract

The chemical composition of thin native oxide layers grown on GaAs and InAs by ultraviolet (UV)/ozone and thermal oxidation is investigated using x-ray-photoelectron spectroscopy. Core-level binding energies, core-level intensities, and valence-band spectra are compared with data for bulk crystalline binary or ternary As, In, and Ga oxides. The chemical compositions, which vary strongly from GaAs to InAs and from thermal to UV oxidation, appear to be controlled by both thermodynamic and kinetic factors. Only for GaAs thermal oxidation are the products predicted at thermodynamic equilibrium obtained. In all cases the native oxides can be described as single phase nonstoichiometric compounds and not as a macroscopic mixture of stoichiometric binary oxides.

  • Received 29 November 1993

DOI:https://doi.org/10.1103/PhysRevB.49.11159

©1994 American Physical Society

Authors & Affiliations

G. Hollinger, R. Skheyta-Kabbani, and M. Gendry

  • Laboratoire d’Electronique, LEAME, Ecole Centrale de Lyon, 69131 Ecully Cédex, France

References (Subscription Required)

Click to Expand
Issue

Vol. 49, Iss. 16 — 15 April 1994

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×