Point defect movement and annealing in collision cascades

K. Nordlund and R. S. Averback
Phys. Rev. B 56, 2421 – Published 1 August 1997
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Abstract

The effect of collision cascades on preexisting point defects in crystalline materials was studied by simulating 5 keV collision cascades in gold, copper, aluminum, platinum, and silicon. The results indicate that collision cascades do not significantly affect interstitials or vacancies outside the liquid core of the cascade, although in the fcc metals the heating of the crystal due to the cascade causes some thermal migration of the interstitials. Within the liquid cascade core, both interstitials and vacancies move towards the center of the molten region when it resolidifies and recombine or cluster there. At elevated temperatures, random jumps of interstitials during the thermal-spike phase can cause significant additional trapping of interstitials in the liquid. In contrast to the annealing effects of preexisting damage in the fcc metals, in silicon the amount of new damage created by a cascade is roughly independent of the number of initial point defects. The difference is attributed to the nature of the bonding in the materials.

  • Received 20 December 1996

DOI:https://doi.org/10.1103/PhysRevB.56.2421

©1997 American Physical Society

Authors & Affiliations

K. Nordlund and R. S. Averback

  • Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801

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Vol. 56, Iss. 5 — 1 August 1997

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