Epitaxial growth and properties of cobalt-doped ZnO on αAl2O3 single-crystal substrates

A. C. Tuan, J. D. Bryan, A. B. Pakhomov, V. Shutthanandan, S. Thevuthasan, D. E. McCready, D. Gaspar, M. H. Engelhard, J. W. Rogers, Jr., K. Krishnan, D. R. Gamelin, and S. A. Chambers
Phys. Rev. B 70, 054424 – Published 30 August 2004

Abstract

Co-doped ZnO(CoxZn1xO) is of potential interest for spintronics due to the prediction of room-temperature ferromagnetism. We have grown epitaxial CoxZn1xO films on Al2O3(012) substrates by metalorganic chemical vapor deposition using a liquid precursor delivery system. High concentrations of Co(x0.35) can be uniformly incorporated into the film without phase segregation. Co is found to be in the +2 oxidation state, independent of x, by both surface-sensitive core-level x-ray photoemission and bulk-sensitive optical absorption spectroscopies. This material can be grown n-type by the deliberate incorporation of oxygen vacancies, but not by inclusion of 1 at. % Al. Semiconducting films remain ferromagnetic up to 350K. In contrast films without oxygen vacancies are insulating and nonmagnetic, suggesting that exchange interaction is mediated by itinerant carriers. The saturation and remanent magnetization on a per Co basis was very small (<0.1μBCo), even in the best films. The dependence of saturation magnetization, as measured by optical magnetic circular dichroism, on magnetic field and temperature, agrees with the theoretical Brillouin function, demonstrating that the majority of the Co(II) ions behave as magnetically isolated S=32 ions.

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  • Received 19 August 2003

DOI:https://doi.org/10.1103/PhysRevB.70.054424

©2004 American Physical Society

Authors & Affiliations

A. C. Tuan1, J. D. Bryan2, A. B. Pakhomov3, V. Shutthanandan4, S. Thevuthasan4, D. E. McCready4, D. Gaspar4, M. H. Engelhard4, J. W. Rogers, Jr.4, K. Krishnan3, D. R. Gamelin2, and S. A. Chambers5,*

  • 1Department of Chemical Engineering, University of Washington, Seattle, Washington, USA
  • 2Department of Chemistry, University of Washington, Seattle, Washington, USA
  • 3Department of Materials Science and Engineering, University of Washington, Seattle, Washington, USA
  • 4Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352, USA
  • 5Fundamental Science Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352, USA

  • *Corresponding author.

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Vol. 70, Iss. 5 — 1 August 2004

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