Mapping the effective mass of electrons in III-V semiconductor quantum confined structures

M. H. Gass, A. J. Papworth, R. Beanland, T. J. Bullough, and P. R. Chalker
Phys. Rev. B 73, 035312 – Published 12 January 2006

Abstract

The electron effective mass me* can be calculated from the Kramers-Kronig transformation of electron energy loss spectra (EELS) for III-V semiconductor materials. The mapping capabilities of a scanning transmission electron microscope, equipped with a Gatan Enfina EELS system are exploited to produce maps showing the variation of me* with nanometer scale resolution for a range of semiconductors. The analysis was carried out on three material systems: a GaInNAs quantum well in a GaAs matrix; InAs quantum dots in a GaAs matrix, and bulk wurzitic GaN. Values of me* were measured as 0.07m0 for GaAs and 0.183m0 for GaN, both in excellent agreement with the literature. It has also been shown that the high frequency dielectric constant can be calculated using the Kramers-Kronig methodology. When the high frequency dielectric constant is incorporated into the calculations a much more accurate visual representation of me* is displayed in the maps.

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  • Received 7 October 2005

DOI:https://doi.org/10.1103/PhysRevB.73.035312

©2006 American Physical Society

Authors & Affiliations

M. H. Gass1,*, A. J. Papworth2, R. Beanland3, T. J. Bullough2, and P. R. Chalker2

  • 1Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, United Kingdom
  • 2Department of Engineering, University of Liverpool, Liverpool L69 3GH, United Kingdom
  • 3Bookham Technology, Caswell, Towcester, Northants NN12 8EQ, United Kingdom

  • *Corresponding author. Electronic address: mhg25@cam.ac.uk

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Issue

Vol. 73, Iss. 3 — 15 January 2006

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