Ideal strength of silicon: An ab initio study

S. M.-M. Dubois, G.-M. Rignanese, T. Pardoen, and J.-C. Charlier
Phys. Rev. B 74, 235203 – Published 5 December 2006

Abstract

The ideal strength of silicon is predicted along various loading paths using density functional theory. Stress-strain curves are calculated under uniaxial tension, relaxed shear, and uniaxial deformation conditions. In order to check the stability of the deformation paths, the phonon spectra and the stiffness tensors are computed within density-functional perturbation theory. A second-order phase transition is found to occur before the elastic instability when applying a {111}1¯1¯2 relaxed shear. In all the other deformation conditions, the first predicted instabilities are located at the center of the Brillouin zone. Finally, the crystallographic nature of the instabilities is investigated by the calculation of the phonon eigendisplacements and by the decomposition of the stiffness tensors.

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  • Received 10 April 2006

DOI:https://doi.org/10.1103/PhysRevB.74.235203

©2006 American Physical Society

Authors & Affiliations

S. M.-M. Dubois1,*, G.-M. Rignanese1,2, T. Pardoen2,3, and J.-C. Charlier1,2

  • 1Unité de Physico-Chimie et de Physique des Matériaux (PCPM), Université catholique de Louvain, Place Croix du Sud, 1 (Boltzmann) B-1348 Louvain-la-Neuve, Belgium
  • 2Research Center in Micro and Nanoscopic Materials and Electronic Devices (CERMIN), Université catholique de Louvain B-1348 Louvain-la-Neuve, Belgium
  • 3Unité d’Ingénierie des Matériaux et des Procédés (IMAP) Université catholique de Louvain, Place Sainte Barbe, 2 (Réaumur) B-1348 Louvain-la-Neuve, Belgium

  • *Electronic address: sdubois@pcpm.ucl.ac.be

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Issue

Vol. 74, Iss. 23 — 15 December 2006

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