Bismuth-stabilized (2×1) and (2×4) reconstructions on GaAs(100) surfaces: Combined first-principles, photoemission, and scanning tunneling microscopy study

M. P. J. Punkkinen, P. Laukkanen, H.-P. Komsa, M. Ahola-Tuomi, N. Räsänen, K. Kokko, M. Kuzmin, J. Adell, J. Sadowski, R. E. Perälä, M. Ropo, T. T. Rantala, I. J. Väyrynen, M. Pessa, L. Vitos, J. Kollár, S. Mirbt, and B. Johansson
Phys. Rev. B 78, 195304 – Published 4 November 2008

Abstract

Bismuth adsorbate-stabilized (2×1) and (2×4) reconstructions of the GaAs(100) surfaces have been studied by first-principles calculations, valence-band and core-level photoelectron spectroscopies, and scanning tunneling microscopy. It is demonstrated that large Bi atom size leads to the formation of the pseudogap at the Fermi energy and to the lower energy of an adsorbate-derived surface band, which contributes to the stabilization of the exceptional Bi/GaAs(100)(2×1) reconstruction. It is proposed that the Bi/GaAs(100)(2×4) reconstructions include asymmetric mixed Bi-As dimers, in addition to the Bi-Bi dimers. Based on the calculations, we solve the atomic origins of the surface core-level shifts (SCLSs) of the Bi5d photoemission spectra from the Bi/GaAs(100)(2×4) surfaces. This allows for resolving the puzzle related to the identification of two SCLS components often found in the measurements of the Bi5d and Sb4d core-level emissions of the Bi/III-V and Sb/III-V(100)(2×4) surfaces. Finally, the reason for the absence of the common (2×4)β2 structure and additional support for the stability of the (2×1) structure on the Bi/III-V(100) surfaces are discussed in terms of Bi atom size and subsurface stress.

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  • Received 11 July 2008

DOI:https://doi.org/10.1103/PhysRevB.78.195304

©2008 American Physical Society

Authors & Affiliations

M. P. J. Punkkinen1,*, P. Laukkanen1,2,†, H.-P. Komsa3, M. Ahola-Tuomi1, N. Räsänen1, K. Kokko1, M. Kuzmin1, J. Adell4, J. Sadowski4,5, R. E. Perälä1, M. Ropo6, T. T. Rantala3, I. J. Väyrynen1, M. Pessa2, L. Vitos7,8,9, J. Kollár9, S. Mirbt8, and B. Johansson7,8,10

  • 1Department of Physics, University of Turku, FI-20014 Turku, Finland
  • 2Optoelectronics Research Centre, Tampere University of Technology, FI-33101 Tampere, Finland
  • 3Department of Physics, Tampere University of Technology, FI-33101 Tampere, Finland
  • 4Department of Applied Physics, Chalmers University of Technology, SE-41296 Göteborg, Sweden and MAX-lab, Lund University, SE-221 00 Lund, Sweden
  • 5Institute of Physics, Polish Academy of Sciences, al. Lotnikow 32/46, 02-668 Warszawa, Poland
  • 6Department of Information Technology, Åbo Akademi University, FI-20500 Turku, Finland
  • 7Department of Materials Science and Engineering, Applied Materials Physics, Royal Institute of Technology, SE-10044 Stockholm, Sweden
  • 8Department of Physics and Materials Science, Division for Materials Theory, Uppsala University, SE-75121 Uppsala, Sweden
  • 9Research Institute for Solid State Physics and Optics, P.O. Box 49, H-1525 Budapest, Hungary
  • 10School of Physics and Optoelectronic Technology and College of Advanced Science and Technology, Dalian University of Technology, Dalian 116024, China

  • *Authors to whom correspondence should be addressed. marko.punkkinen@utu.fi
  • pekka.laukkanen@utu.fi

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Vol. 78, Iss. 19 — 15 November 2008

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