Simulation of piezoresistivity in n-type single-crystal silicon on the basis of the first-principles band structure

Koichi Nakamura, Yoshitada Isono, Toshiyuki Toriyama, and Susumu Sugiyama
Phys. Rev. B 80, 045205 – Published 13 July 2009

Abstract

We have simulated the piezoresistivity in n-type single-crystal bulk silicon based on the first-principles electronic band structure of model structures. Our simple procedure to calculate the piezoresistance coefficients is valid qualitatively and quantitatively for carrier electron transport in the multivalley conduction-band structure of n-type bulk silicon; the primitive longitudinal and transverse piezoresistance coefficients originate from the energy gap between the valleys, whereas the shear piezoresistance coefficient π44 arises from a distortion of the band energy surface in the valleys and can be presented clearly as a negative constant. The distinction between the origins of longitudinal, transverse, and shear piezoresistivity can be followed as a dependence on a carrier concentration or temperature.

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  • Received 11 March 2009

DOI:https://doi.org/10.1103/PhysRevB.80.045205

©2009 American Physical Society

Authors & Affiliations

Koichi Nakamura*

  • Office of Science and Engineering Research, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

Yoshitada Isono

  • Department of Mechanical Engineering, Kobe University, Kobe 657-8501, Japan

Toshiyuki Toriyama

  • Department of Micro System Technology, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

Susumu Sugiyama

  • Ritsumeikan Global Innovation Research Organization, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

  • *Present address: Research Institute for Nanomachine System Technology, Ritsumeikan University, Kusatsu, Shiga 525–8577, Japan; koichi-a@st.ritsumei.ac.jp

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Issue

Vol. 80, Iss. 4 — 15 July 2009

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