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Strained state dynamics in a VO2 thin film

T. Kikuzuki, R. Takahashi, and M. Lippmaa
Phys. Rev. B 82, 144113 – Published 20 October 2010

Abstract

The dynamics of a strain-induced resistive phase transition in a VO2 thin film was studied by using a low-frequency crystal bending stage. It was found that the resistance response of the film to strain excitation is determined by two time constants, interpreted as a nucleation lifetime, in the 106104s range, and a domain growth lifetime of 103s. The variation of the domain nucleation lifetime is discussed in terms of the barrier height separating the coexisting insulating and metallic phases in a VO2 film. Below the transition temperature, the phase transition is nucleation limited. Above the transition temperature, the resistance change is strongly affected by the growth of metallic domains. Direct imaging of metallic domains by local-probe current mapping showed that the phase transition in a thin film is limited by the presence of grain boundaries.

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  • Received 17 May 2010

DOI:https://doi.org/10.1103/PhysRevB.82.144113

©2010 American Physical Society

Authors & Affiliations

T. Kikuzuki, R. Takahashi, and M. Lippmaa*

  • Institute for Solid State Physics, University of Tokyo, Chiba 277-8581, Japan

  • *mlippmaa@issp.u-tokyo.ac.jp

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Issue

Vol. 82, Iss. 14 — 1 October 2010

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