Determination of the Ge-nanocrystal/SiO2 matrix interface trap density from the small signal response of charge stored in the nanocrystals

R. Peibst, J. S. de Sousa, and K. R. Hofmann
Phys. Rev. B 82, 195415 – Published 9 November 2010

Abstract

We investigate the linear response of charge stored in Ge nanocrystals (NCs) embedded in SiO2 to an alternating electric field in order to study the electronic properties of the Ge-NC/SiO2 interface. Experimentally, the modulation of the cluster charge is sensed by the transient drain current of field-effect transistors in whose gate oxide the nanocrystals are embedded. For interpretation of the experimental results, we present a small-signal model obtained from a first-order expansion of the general quantum-mechanical description of the system. The contribution of trap states to the alternation of the cluster charge is distinguished from that of quantized states in the NC conduction band by calculating the latter one by density functional theory and subtracting it from the experimental values. A high Ge-NC/SiO2 interface density of 2.8×1013cm2eV1 is obtained. These traps cannot be passivated efficiently by a hydrogen anneal at 450°C and mediate efficient nonradiative recombination processes.

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  • Received 28 June 2010

DOI:https://doi.org/10.1103/PhysRevB.82.195415

©2010 American Physical Society

Authors & Affiliations

R. Peibst1,*, J. S. de Sousa2, and K. R. Hofmann1

  • 1Institute of Electronic Materials and Devices, Leibniz Universität Hannover, 30167 Hannover, Germany
  • 2Departamento de Física, Universidade Ferderal do Ceará, 60455-900 Fortaleza, Brazil

  • *peibst@mbe.uni-hannover.de

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Vol. 82, Iss. 19 — 15 November 2010

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