Growth and Structure of Crystalline Silica Sheet on Ru(0001)

D. Löffler, J. J. Uhlrich, M. Baron, B. Yang, X. Yu, L. Lichtenstein, L. Heinke, C. Büchner, M. Heyde, S. Shaikhutdinov, H.-J. Freund, R. Włodarczyk, M. Sierka, and J. Sauer
Phys. Rev. Lett. 105, 146104 – Published 30 September 2010
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Abstract

Thin SiO2 films were grown on a Ru(0001) single crystal and studied by photoelectron spectroscopy, infrared spectroscopy and scanning probe microscopy. The experimental results in combination with density functional theory calculations provide compelling evidence for the formation of crystalline, double-layer sheet silica weakly bound to a metal substrate.

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  • Received 9 July 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.146104

© 2010 The American Physical Society

Authors & Affiliations

D. Löffler1, J. J. Uhlrich1, M. Baron1, B. Yang1, X. Yu1, L. Lichtenstein1, L. Heinke1, C. Büchner1, M. Heyde1, S. Shaikhutdinov1,*, H.-J. Freund1, R. Włodarczyk2, M. Sierka2,*, and J. Sauer2

  • 1Department of Chemical Physics, Fritz Haber Institute of the Max Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
  • 2Institute of Chemistry, Humboldt University, Brook-Taylor-Strasse 2, 12489 Berlin, Germany

  • *Corresponding authors: shaikhutdinov@fhi-berlin.mpg.de; marek.sierka@chemie.hu-berlin.de.

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Vol. 105, Iss. 14 — 1 October 2010

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