Abstract
By first principles analysis, we systematically investigate effects of oxygen vacancies (OV) in the MgO barrier of magnetic tunnel junctions. The interchannel diffusive scattering by disordered OVs located at or near the interface drastically reduces the tunnel magnetoresistance ratio (TMR) from the ideal theoretical limit to the presently observed much smaller experimental range. Interior OVs are far less important in influencing TMR, but they significantly increase the junction resistance. Filling OV with nitrogen atoms restores TMR to near the ideal theoretical limit.
- Received 12 August 2010
DOI:https://doi.org/10.1103/PhysRevLett.105.236801
© 2010 The American Physical Society