Abstract
The channeling of electrons along or between atomic rows in a crystal is used as the basis of a powerful lattice-location technique capable of analyzing small quantities of crystal impurities with high spatial resolution. We demonstrate the technique by locating Sb dopant in Si and compare the results with ion-channeling and planar-electron-channeling analysis. Delocalization corrections are required with the electron-channeling analyses.
- Received 27 September 1984
DOI:https://doi.org/10.1103/PhysRevLett.54.1543
©1985 American Physical Society