Observation of Interface Band Structure by Ballistic-Electron-Emission Microscopy

L. D. Bell and W. J. Kaiser
Phys. Rev. Lett. 61, 2368 – Published 14 November 1988
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Abstract

A unique ballistic-electron spectroscopy technique has been employed to measure directly semiconductor-band-structure properties at a subsurface interface for the first time. Further, the method, based on scanning tunneling microscopy, enables spatially resolved carrier-transport spectroscopy of interfaces. A theoretical treatment has been developed which accurately accounts for the observed spectroscopic features.

  • Received 3 August 1988

DOI:https://doi.org/10.1103/PhysRevLett.61.2368

©1988 American Physical Society

Authors & Affiliations

L. D. Bell and W. J. Kaiser

  • Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109

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Issue

Vol. 61, Iss. 20 — 14 November 1988

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