Proton diffusion in crystalline silicon

F. Buda, Guido L. Chiarotti, R. Car, and M. Parrinello
Phys. Rev. Lett. 63, 294 – Published 17 July 1989
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Abstract

An ab initio molecular dynamics simulation of high-temperature proton diffusion in crystalline silicon is presented. This is the first time dynamical effects have been included explicitly in the simulation of this system. We find that the diffusion proceeds via a jumplike mechanism. Because of dynamical effects the diffusion path is substantially different from that inferred from static total-energy calculations. The calculated diffusion coefficient and its temperature dependencne are in good agreement with the available experimental data. It is suggested that scattering experiments may distinguish between different diffusion paths.

  • Received 3 April 1989

DOI:https://doi.org/10.1103/PhysRevLett.63.294

©1989 American Physical Society

Authors & Affiliations

F. Buda, Guido L. Chiarotti, R. Car, and M. Parrinello

  • International School for Advanced Studies, 34014 Trieste, Italy

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Issue

Vol. 63, Iss. 3 — 17 July 1989

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