Directional Anisotropy in the Cleavage Fracture of Silicon

Rubén Pérez and Peter Gumbsch
Phys. Rev. Lett. 84, 5347 – Published 5 June 2000
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Abstract

Total-energy pseudopotential calculations are used to study the cleavage anisotropy in silicon. It is shown that cracks propagate easily on {111} and {110} planes provided crack propagation proceeds in the 1¯10 direction. In contrast, if the crack is driven in a 001 direction on a {110} plane the bond breaking process is discontinuous and associated with pronounced relaxations of the surrounding atoms, which results in a large lattice trapping. The different lattice trapping for different crack propagation directions can explain the experimentally observed cleavage anisotropy in silicon single crystals.

  • Received 4 November 1999

DOI:https://doi.org/10.1103/PhysRevLett.84.5347

©2000 American Physical Society

Authors & Affiliations

Rubén Pérez1,2 and Peter Gumbsch2

  • 1Departamento de Física Teórica de la Materia Condensada, Universidad Autónoma de Madrid, E-28049 Madrid, Spain
  • 2Max Planck Institut für Metallforschung, Seestrasse 92, 70174 Stuttgart, Germany

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Vol. 84, Iss. 23 — 5 June 2000

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