Metal-Semiconductor Nanocontacts: Silicon Nanowires

Uzi Landman, Robert N. Barnett, Andrew G. Scherbakov, and Phaedon Avouris
Phys. Rev. Lett. 85, 1958 – Published 28 August 2000
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Abstract

Silicon nanowires assembled from clusters or etched from the bulk, connected to aluminum electrodes and passivated, are studied with large-scale local-density-functional simulations. Short (0.6nm) wires are fully metallized by metal-induced gap states resulting in finite conductance (e2/h). For longer wires (2.5nm) nanoscale Schottky barriers develop with heights larger than the corresponding bulk value by 40% to 90%. Electric transport requires doping dependent gate voltages with the conductance spectra exhibiting interference resonances due to scattering of ballistic channels by the contacts.

  • Received 16 November 1999

DOI:https://doi.org/10.1103/PhysRevLett.85.1958

©2000 American Physical Society

Authors & Affiliations

Uzi Landman1, Robert N. Barnett1, Andrew G. Scherbakov1, and Phaedon Avouris2

  • 1School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332-0430
  • 2IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598

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Vol. 85, Iss. 9 — 28 August 2000

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