Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films

A. Yanguas-Gil, J. Cotrino, A. Barranco, and A. R. González-Elipe

Phys. Rev. Lett. 96, 236101 – Published 14 June 2006

Abstract

The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent $β$ that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of $β$ ranging from 0.86 to 0.2 are obtained.

Received 16 December 2005

DOI:https://doi.org/10.1103/PhysRevLett.96.236101

Authors & Affiliations

A. Yanguas-Gil^1,*, J. Cotrino^1,2, A. Barranco^1,3, and A. R. González-Elipe¹

¹Instituto de Ciencia de Materiales de Sevilla (CSIC - University of Sevilla), Av Américo Vespucio 49, 41092 Sevilla, Spain
²Departamento de Física Atómica, Molecular y Nuclear, Av Américo Vespucio 49, 41092 Sevilla, Spain
³Departamento de Química Inorgánica (University of Sevilla), Av Américo Vespucio 49, 41092 Sevilla, Spain

^*Electronic address: angel.yanguas@icmse.csic.es. Present address: Fakultät für Physik und Astronomie, Ruhr Universität, 44780 Bochum, Germany.

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Vol. 96, Iss. 23 — 16 June 2006

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