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Stereo‐thermal‐lithography: a new principle for rapid prototyping

P.J. Bartolo (P.J. Bartolo is based at the Department of Mechanical Engineering, School of Technology, Leiria Polytechnic Institute, Leiria, Portugal)
G. Mitchell (G. Mitchell is based at Polymer Science Centre, J.J. Thomson Physical Laboratory, University of Reading, Reading, UK)

Rapid Prototyping Journal

ISSN: 1355-2546

Article publication date: 1 August 2003

2003

Abstract

A new fabrication process for rapid prototyping is proposed in this paper. Optical and thermal effects are simultaneously used in this process to locally induce a phase change in a liquid resin. This phase change phenomena is used to “write” three‐dimensional shapes or patterns. Such objects or patterns can involve macroscopic engineering prototypes through to nanostructures for exploitation in waveguiding and photonic crystals. Several advantages can be achieved through this new process, in terms of accuracy, cost and time.

Keywords

Citation

Bartolo, P.J. and Mitchell, G. (2003), "Stereo‐thermal‐lithography: a new principle for rapid prototyping", Rapid Prototyping Journal, Vol. 9 No. 3, pp. 150-156. https://doi.org/10.1108/13552540310477454

Publisher

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MCB UP Ltd

Copyright © 2003, MCB UP Limited

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