Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 um

Paul Coudray; J. E. Chisham; Mark P. Andrews; S. Iraj Najafi

doi:10.1117/1.601243

1 April 1997 Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 um

Paul Coudray, J. E. Chisham, Mark P. Andrews, S. Iraj Najafi

Optical Engineering, Vol. 36, Issue 4, (April 1997). https://doi.org/10.1117/1.601243

The fabrication and characterization of UV-light-imprinted solgel silica glass waveguides on glass and silicon substrates are described. Waveguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-?m wavelength. Propagation losses in these waveguides are less than 0.3 dB/cm.

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Paul Coudray, J. E. Chisham, Mark P. Andrews, and S. Iraj Najafi "Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 um," Optical Engineering 36(4), (1 April 1997). https://doi.org/10.1117/1.601243

Published: 1 April 1997

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