Characteristic of bound-abrasive polishing for fused silica glass in anhydrous environment

Wen Jun Liu; Wei Yang; Yin Biao Guo

doi:10.1117/12.2504799

16 January 2019 Characteristic of bound-abrasive polishing for fused silica glass in anhydrous environment

Wen Jun Liu, Wei Yang, Yin Biao Guo

Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 1083808 (2019) https://doi.org/10.1117/12.2504799
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

To overcome the randomness of free abrasive polishing, the abrasive waste, the resulting hydration layer and other issues, this paper presents the characteristic of bound abrasive polishing for fused silica glass in anhydrous environment. A stable sintering process with a fine grooved polishing wheel is developed, which is applied to polish the fused silica glass. Macroscopically, the influence of pressure and rotational speed on the removal rate and surface roughness is explored. Microscopically, the mechanism of material removal, the chemical reaction and the mechanical action produced by the removal process are expounded by using EDS, XRD and FTIR analysis. The removal rate does not follow the Preston formula, temperature rise and the capacity of chip removal on the polishing wheel are the key factors. Furthermore, the experimental results show that the Ce-O-Si bond is formed by CeO₂ abrasive grains and fused silica under the action of normal force. The bond energy is larger than that of fused silica Si-O-Si bond, so the CeO₂ tears away SiO₂ out of the glass surface under the action of shear force.

Citation Download Citation

Wen Jun Liu, Wei Yang, and Yin Biao Guo "Characteristic of bound-abrasive polishing for fused silica glass in anhydrous environment", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 1083808 (16 January 2019); https://doi.org/10.1117/12.2504799

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