Abstract
We have studied silicon tetrachloride hydrogenation in an rf (40.68 MHz) plasma and have determined the trichlorosilane yield as a function of the molar energy input, H2: SiCl4 molar ratio, and pressure. The highest trichlorosilane yield achieved is 60%, and the minimum energy input is 0.3 kW h per mole of SiHCl3.
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Original Russian Text © A.V. Gusev, R.A. Kornev, A.Yu. Sukhanov, 2006, published in Neorganicheskie Materialy, 2006, Vol. 42, No. 9, pp. 1123–1126.
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Gusev, A.V., Kornev, R.A. & Sukhanov, A.Y. Preparation of trichlorosilane by plasma hydrogenation of silicon tetrachloride. Inorg Mater 42, 1023–1026 (2006). https://doi.org/10.1134/S0020168506090172
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DOI: https://doi.org/10.1134/S0020168506090172