Modification of the electronic structure and formation of an accumulation layer in ultrathin Ba/n-GaN and Ba/n-AlGaN interfaces

Abstract

The electronic structure of the n-GaN(0001) and Al _x Ga_{1 − x} N(0001) (x = 0.16, 0.42) surfaces and the Ba/n-GaN and Ba/AlGaN interfaces is subjected to in situ photoemission investigations in the submonolayer Ba coverage range. The photoemission spectra of the valence band and the spectra of the surface states and the core 3d level of Ga, the 2p level of Al, and the 4d and 5p levels of Ba are studied during synchrotron excitation in the photon energy range 50–400 eV. A spectrum of the surface states in Al _x Ga_{1 − x} N (x = 0.16, 0.42) is found. The electronic structure of the surface and the near-surface region is found to undergo substantial changes during the formation of the Ba/n-GaN and Ba/AlGaN interfaces. The effect of narrowing the photoemission spectrum in the valence band region from 10 to 2 eV is detected, and surface eigenstates are suppressed. The Ba adsorption is found to induce the appearance of a new photoemission peak in the bandgap at the Fermi level in the Ba/n-GaN and Ba/n-Al_0.16Ga_0.84N interfaces. The nature of this peak is found to be related to the creation of an accumulation layer due to a change in the near-surface potential and enriching band bending. The energy parameters of the potential well of the accumulation layer are shown to be controlled by the Ba coverage.