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Internal Stresses in Mo/Y Multilayer Mirrors

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Abstract—

Mo/Y multilayer mirrors designed to operate in the range of 9–11 nm are considered. The dependence of the internal stress of such mirrors on the molybdenum fraction is studied for the first time. It is shown that structures with zero stress are characterized by a reflection coefficient of about 6%. The experimentally obtained maximum reflection coefficient (30%) corresponds to a stress of –160 MPa. The influence of a buffer layer of boron carbide on the internal stress and reflectance factor of the Mo/Y mirrors is investigated. A Cr/Y structure is proposed for compensation of elastic deformations of the substrate in manufacturing highly reflective Mo/Y multilayer mirrors.

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ACKNOWLEDGMENTS

The work was performed using equipment of the center “Physics and technology of micro- and nanostructures” Institute for Physics of Microstructures of the Russian Academy of Sciences with the support of Russian Foundation for Basic Research (grants no. 17-52-150006, no. 18-32-00671) and in the framework of the state task Institute for Physics of Microstructures of the Russian Academy of Sciences (theme no. 0035-2014-0204) with the support of the Presidium of the Russian Academy of Sciences (programs I. 1 “Extreme light fields and their interaction with matter” and I. 2 “Nanostructures: physics, chemistry, biology, foundations of technologies”). In the part of the synthesis of Mo/Y coatings, with support of the RNF (grant no. 17-12-01227).

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Authors and Affiliations

  1. Institute for Physics of Microstructures of the Russian Academy of Sciences, 603087, Nizhny Novgorod, Russia

    D. S. Kvashennikov, Yu. A. Vainer, S. Yu. Zuev & V. N. Polkovnikov

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  1. D. S. Kvashennikov
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  2. Yu. A. Vainer
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  3. S. Yu. Zuev
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  4. V. N. Polkovnikov
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Correspondence to V. N. Polkovnikov.

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Translated by N. Petrov

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Kvashennikov, D.S., Vainer, Y.A., Zuev, S.Y. et al. Internal Stresses in Mo/Y Multilayer Mirrors. J. Surf. Investig. 13, 177–181 (2019). https://doi.org/10.1134/S1027451019020113

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  • DOI: https://doi.org/10.1134/S1027451019020113

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