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Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering

  • Surface Physics and Thin Films
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Abstract

The influence of the bias voltage polarity U s on microstructure, crystallographic texture and magnetic properties has been investigated for Ni films with a thickness of ≈15–420 nm, which are obtained via magnetron sputtering at a working gas pressure P corresponding to the collision-deficient flight mode of atoms of the sputtered target between the target and the substrate. The Ni(111)-textured films have been shown to form at U s ≈–100 V, whose microstructure and magnetic parameters are almost unchanged with a thickness. In contrast, the Ni(200) films are formed at U s ≈ +100 V, whose magnetic properties and micro-structure depend significantly on the thickness d that manifests in a critical thickness d* ≈ 150 nm, when the structure of the film becomes inhomogeneous in the thickness, the remagnetization loops are changed from rectangular to supercritical with the formation of the band domain structure.

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Authors and Affiliations

  1. Saratov Branch of the Kotel’nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences, ul. Zelenaya 38, Saratov, 410019, Russia

    A. S. Dzhumaliev, Yu. V. Nikulin & Yu. A. Filimonov

  2. Saratov State University named after N.G. Chernyshevsky, Astrakhanskaya ul. 83, Saratov, 410012, Russia

    A. S. Dzhumaliev, Yu. V. Nikulin & Yu. A. Filimonov

  3. Yuri Gagarin State Technical University of Saratov, Politekhnicheskaya ul. 77, Saratov, 410054, Russia

    Yu. A. Filimonov

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  1. A. S. Dzhumaliev
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  3. Yu. A. Filimonov
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Correspondence to Yu. V. Nikulin.

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Original Russian Text © A.S. Dzhumaliev, Yu.V. Nikulin, Yu.A. Filimonov, 2016, published in Fizika Tverdogo Tela, 2016, Vol. 58, No. 6, pp. 1206–1215.

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Dzhumaliev, A.S., Nikulin, Y.V. & Filimonov, Y.A. Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering. Phys. Solid State 58, 1247–1256 (2016). https://doi.org/10.1134/S1063783416060135

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  • DOI: https://doi.org/10.1134/S1063783416060135

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