Abstract
Reactions between polypyromellitamido acid and component materials of microelectronic articles were examined by thermogravimetric analysis. Modes of modification of the surfaces of semiconductor structures to be used in formation of a system of interconnections with polyimide as interlayer insulator to obtain a high adhesion between the layers via their chemical reactions.
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Original Russian Text © S.F. Sen’ko, Yu.P. Snitovskii, 2006, published in Zhurnal Prikladnoi Khimii, 2006, Vol. 79, No. 10, pp. 1701–1705.
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Sen’ko, S.F., Snitovskii, Y.P. Adhesion of polyimide films to microelectronic article components. Russ J Appl Chem 79, 1681–1685 (2006). https://doi.org/10.1134/S1070427206100259
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DOI: https://doi.org/10.1134/S1070427206100259