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Internal Stresses in Plasma Deposited Polymer Film Coatings

  • PLASMOCHEMICAL METHODS OF PRODUCTION AND TREATMENT OF MATERIALS
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Inorganic Materials: Applied Research Aims and scope

Abstract

A technique for measuring the internal stresses in polymer films deposited on a glass substrate in gas discharge plasma is developed. Using this technique, the dependence of internal stress in thin films of polymethylmethacrylate and polystyrene on the deposition time and the current density of the barrier discharge at atmospheric pressure is studied. It is found that, when forming thin polymer coatings from monomers with high polymerization efficiency, the average value of internal stresses is higher than that for coatings obtained from monomers having low polymerization efficiency in barrier discharge plasma at atmospheric pressure. This can be explained by an increase in the specific number of cross-links in the first type of films under the action of ultraviolet radiation from the plasma. The quasi-optimal deposition time of the polymer film coating from styrene is found in which the value of the internal stress is minimal at a film thickness acceptable for a number of practical applications.

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ACKNOWLEDGMENTS

The measurements were carried out with the use of the equipment of Federal Common Use Center of Physicochemical Studies of Kazan Federal University (KFU). A.I. Gumarov, I.V. Yanilkin, I.R. Vakhitov, and L.R. Tagirov thank the KFU Competitiveness Improvement Program for support.

This work was partially supported by the economic contract no. MML-1 (KNRTU-KAI—Romashin Joint Research and Production Enterprise Tekhnologiya).

CONFLICT OF INTERESTS

The authors declare that they have no conflict of interest.

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Correspondence to M. P. Danilaev, E. A. Bogoslov, I. V. Yanilkin, I. R. Vakhitov, A. I. Gumarov or L. R. Tagirov.

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Translated by Sh. Galyaltdinov

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Danilaev, M.P., Bogoslov, E.A., Polsky, Y.E. et al. Internal Stresses in Plasma Deposited Polymer Film Coatings. Inorg. Mater. Appl. Res. 10, 556–559 (2019). https://doi.org/10.1134/S2075113319030079

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  • DOI: https://doi.org/10.1134/S2075113319030079

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