Abstract
The works devoted to the electrodeposition of metals, alloys, and semiconductors onto the substrates through the templates of various non-conducting materials with pores of various shapes and sizes are reviewed. The composite materials, nanowires, metal foams, and the parts with nanostructured surface obtained by this method are promising materials for the electrocatalysis, electroanalysis of media, development of various sensors, modern miniature magnetic memory devices, optoelectronics, power sources, etc.
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Wang, X.W., Yuan, Z.H., and Li, J.S., Mater. Characterization, 2011, vol. 62, p. 642.
AlMawlawi, D., Coombs, N., and Moskovits, M., J. Appl. Phys., 1991, vol. 70, p. 4421.
Borissov, D., Isik-Uppenkamp, S., and Rohwerder, M., J. Phys. Chem. C, 2009, vol. 113, p. 3133.
Proenca, M.P., Sousa, C.T., Ventura, J., Vazquez, M., and Araujo, J.P., Electrochim. Acta, 2012, vol. 72, p. 215.
Rumpf, K., Granitzer, P., Polt, P., Reichmann, A., and Krenn, H., Thin Solid Films, 2006, vol. 515, p. 716.
Xu, C.-L., Li, H., Zhao, G.-Y., and Li, H.-L., Appl. Surface Sci., 2006, vol. 253, p. 1399.
Nielsch, K., Muller, F., Li, A.-P., and Gosele, U., Adv. Mater., 2000, vol. 12, p. 582.
Whitney, T.M., Jiang, J.S., Searson, P.C., and Chien, C.L., Science, 1993, vol. 261, p. 1316.
Napolskii, K.S., Roslyakov, I.V., Eliseev, A.A., Petukhov, D.I., Lukashin, A.V., Chen, S.-F., Liu, C.-P., and Tsirlina, G.A., Electrochim. Acta, 2011, vol. 56, p. 2378.
Motoyama, M., Fukunaka, Y., Sakka, T., Ogata, Y.H., and Kikuchi, S., J. Electroanal. Chem., 2005, vol. 584, p. 84.
Lavin, R., Denardin, J.C., Escrig, J., Altbir, D., Cortes, A., and Gomez, H, J. Appl. Phys., 2009, vol. 106, p. 103903.
Navas, D., Pirota, K.R., Mendoza, Zelis P., Velazquez, D., and Ross, C.A., J. Appl. Phys., 2008, vol. 103, p. 07D523.
Napolskii, K.S., Eliseev, A.A., Yesin, N.V., Lukashin, A.V., Tretyakov, Yu.D., Grigorieva, N.A., Grigoriev, S.V., and Eckerlebe, H., Physica E, 2007, vol. 37, p. 178.
Wang, X.W., Yuan, Z.H., Sun, S.Q., Duan, Y.Q., and Bie, L.J., Phys. Lett. A, 2009, vol. 373, p. 2887.
Xu, J., Huang, X., Xie, G., Fang, Y., and Liu, D., Mater. Lett., 2005, vol. 59, p. 981.
Valizadeh, S., George, J.M., Leisner, P., and Hultman, L., Electrochim. Acta, 2001, vol. 47, p. 865.
Korotkov, V.V., Kudryavtsev, V.N., Zagorskii, D.L., and Bedin, S.A., Gal’vanotekh. Obrab. Poverkhn., 2011, vol. 19, no. 4, p. 23.
Schwanbeck, H. and Schmidt, U., Electrochim. Acta, 2000, vol. 45, p. 4389.
Ren, Y., Liu, Q.F., Li, S.L., Wang, J.B., and Han, X.H., J. Magn. Magn. Mater., 2009, vol. 321, p. 226.
Huang, X., Li, L., Luo, X., Zhu, X., and Li, G., J. Phys. Chem. C, 2008, vol. 112, p. 1468.
Tzaneva, B.R., Naydenov, A.I., Todorova, S.Zh., Videkov, V.H., Milusheva, V.S., and Stefanov, P.K., Electrochim. Acta, 2016, vol. 191, p. 192.
Sulka, G.D., Brzozka, A., Zaraska, L., and Jaskula, M., Electrochim. Acta, 2010, vol. 55, p. 4368.
Choi, J., Sauer, G., Nielsch, K., Wehrspohn, R.B., and Gosele, U., Chem. Mater., 2003, vol. 15, p. 776.
Schuchert, I.U., Toimil Molares, M.E., Dobrev, D., Vetter, J., Neumann, R., and Martin, M., J. Electrochem. Soc., 2003, vol. 150, p. C189.
Riveros, G., Gomez, H., Cortes, A., Marotti, R.E., and Dalchiele, E.A., Appl. Phys. A, 2005, vol. 81, p. 17.
Tobail, O., Quiroga-Gonzalez, E., Carstensen, J., and Foll, H., J. Electrochem. Soc., 2014, vol. 161, p. D657.
Konishi, Y., Motoyama, M., Matsushima, H., Fukunaka, Y., Ishii, R., and Ito, Y., J. Electroanal. Chem., 2003, vol. 559, p. 149.
Napolskii, K.S., Barczuk, P.J., Vassiliev, S.Yu., Veresov, A.G., Tsirlina, G.A., and Kulesza, P.J., Electrochim. Acta, 2007, vol. 52, p. 7910.
Ruan, D., Gao, F., and Gu, Z., J. Electrochem. Soc., 2014, vol. 161, p. D666.
Mollamahalle, Y.B., Ghorbani, M., and Dolati, A., Electrochim. Acta, 2012, vol. 75, p. 157.
Williams, W.D. and Giordano, N., Rev. Sci. Instrum., 1984, vol. 55, p. 410.
Leontiev, A.P., Brylev, O.A., and Napolskii, K.S., Electrochim. Acta, 2015, vol. 155, p. 466.
Li, L., Zhang, Y., Li, G., Wang, X., and Zhang, L., Mater. Lett., 2005, vol. 59, p. 1223.
Ivanov, D.K., Ivanova, Yu.A., Lisenkov, A.D., Zheludkevich, M.L., and Streltsov, E.A., Electrochim. Acta, 2012, vol. 77, p. 65.
Chen, Y., Yang, Y., Chen, X., Liu, F., and Xie, T., Mater. Chem. Phys., 2011, vol. 126, p. 386.
Gomez, H., Riveros, G., Ramirez, D., Henriquez, R., Schrebler, R., Marotti, R., and Dalchiele, E., J. Solid State Electrochem., 2012, vol. 16, p. 197.
Jia, C., Zhang, B., Liu, W., Yao, L., Cai, W., and Li, X., J. Crystal Growth, 2005, vol. 285, p. 527.
Yang, Y.-W., Chen, Y.-B., Liu, F., Chen X.-Y., and Wu Y.-C., Electrochim. Acta, 2001, vol. 56, p. 6420.
Xu, C.-L., Bao, S.-J., Kong, L.-B., Li, H., and Li, H.-L., J. Solid State Chem., 2006, vol. 179, p. 1351.
Liu, H., Lu, B., Wei, S., Bao, M., Wen, Y., and Wang, F., Solid State Sci., 2012, vol. 14, p. 789.
Wang, Q., Mater. Lett., 2009, vol. 63, p. 1493.
Bai, Y., Sun, Y., and Sun, C., Biosens. Bioelectron., 2008, vol. 24, p. 579.
Cui, J., Ogabiela, E.E., Hui, J., Wang, Y., Zhang, Y., Tong, L., Zhang, J., Adeloju, S.B., Zhang, X., and Wu, Y., J. Electrochem. Soc., 2015, vol. 162, p. B62.
Chu, S.Z., Inoue, S., Wada, K., and Kurashima, K., Electrochim. Acta, 2005, vol. 51, p. 820.
Tsyntsaru, N., Silkin, S., Cesiulis, H., Guerrero, M., Pellicer, E., and Sort, J., Electrochim. Acta, 2015, vol. 188, p. 589.
Quiroga-Gonzalez, E., Ossei-Wusu, E., Carstensen, J., and Foll, H., J. Electrochem. Soc., 2011, vol. 158, p. E119.
Kunakova, G., Katkevics, J., Viksna, A., Gertnere, Z., Varghese, J., Holmes, J.D., and Erts, D., Electrochim. Acta, 2015, vol. 170, p. 33.
Biswas, K.G., El Matbouly, H., Rawat, V., Schroeder, J.L., and Sands, T.D., Appl. Phys. Lett., 2009, vol. 95, p. 073108.
Hu, Z.-A., Wu, H., Shang, X., Lu, R.-J., and Li, H.-L., Mater. Res. Bull., 2006, vol. 41, p. 1045.
Hung, P.-K., Lin, T.-H., and Houng, M.-P., J. Electrochem. Soc., 2014, vol. 161, p. D79.
Masuda, H. and Fukuda, K., Science, 1995, vol. 268, p. 1466.
Yanagishita, T. and Masuda, H., Electrochim. Acta, 2015, vol. 184, p. 80.
Brudzisz, A., Brzoska, A., and Sulka, G.D., Electrochim. Acta, 2015, vol. 178, p. 374.
Napolskii, K.S., Roslyakov, I.V., Romanchuk, A.Y., Kapitanova, O.O., Mankevich, A.S., Lebedev, V.A., and Eliseev, A.A., J. Mater. Chem., 2012, vol. 22, p. 11922.
Napolskii, K.S., Roslyakov, I.V., Eliseev, A.A., Byelov, D.V., Petukhov, A.V., Grigoryeva, N.A., Bouwman, W.G., Lukashin, A.V., Chumakov, A.P., and Grigoriev, S.V., J. Phys. Chem. C, 2011, vol. 115, p. 23726.
Li, F., Zhang, L., and Metzger, R.M., Chem. Mater., 1998, vol. 10, p. 2470.
Masuda, H., Asoh, H., Watanabe, M., Nishio, K., Nakao, M., and Tamamura, T., Adv. Mater., 2001, vol. 13, p. 189.
Lee, W., Ji, R., Ross, C.A., Gosele, U., and Nielsch, K., Small, 2006, vol. 2, p. 978.
Montero-Monero, J.M., Belenguer, M., Sarret, M., and Muller, C.M., Electrochim. Acta, 2009, vol. 54, p. 2529.
Li, A.P., Muller, F., Birner, A., Nielsch, K., and Gosele, U., Adv. Mater., 1999, vol. 11, p. 483.
Zaraska, L., Kurowska, E., Sulka, G.D., and Jaskula, M., J. Solid State Electrochem., 2012, vol. 16, p. 3611.
Bakonyi, I. and Peter, L., Prog. Mater. Sci., 2010, vol. 55, p. 107.
Jani, A.M.M., Losic, D., and Voelcker, N.H., Prog. Mater. Sci., 2013, vol. 58, p. 636.
Masuda, H. and Satoh, M., Jpn. J. Appl. Phys., 1996, vol. 35, p. 126.
Gamburg, Yu.D. and Zangari, G., Theory and Practice of Metal Electrodeposition, New York: Springer, 2012.
Whitney, T.M., Jiang, J.S., Searson, P.C., and Chien, C.L., Science, 1993, vol. 261, p. 1316.
Valizadeh, S., George, J.M., Leisner, P., and Hultman, L., Thin Solid Films, 2002, vol. 402, p. 262.
Choi, J., Sauer, G., Nielsch, K., Wehrspohn, R.B., and Gosele, U., Chem. Mater., 2003, vol. 15, p. 776.
Sauer, G., Brehm, G., Schneider, S., Nielsch, K., Wehrspohn, R.B., Choi, J., Hofmeister, H., and Gosele, U., J. Appl. Phys., 2002, vol. 91, p. 3243.
Shin, S., Al-Housseiny, T.T., Kim, B.S., Cho, H.H., and Stone, H.A., Nano Lett, 2014, vol. 14, p. 4395.
Shin, S., Kong, B.H., Kim, B.S., Kim, K.M., Cho, H.K., and Cho, H.H., Nanoscale Res. Lett., 2011, vol. 6, p. 467.
Yin, A.J., Li, J., Jian, W., Bennett, A.J., and Xu, J.M., Appl. Phys. Lett., 2001, vol. 79, p. 1039.
Schonenberger, C., van der Zande, B.M.I., Fokkink, L.G.J., Henny, M., Schmid, C., Kruger, M., Bachtold, A., Huber, R., Birk, H., and Staufer, U., J. Phys. Chem. B, 1997, vol. 101, p. 5497.
Bluhm, E.A., Bauer, E., Chamberlin, R.M., Abney, K.D., Young, J.S., and Jarvinen, G.D., Langmuir, 1999, vol. 15, p. 8668.
Bluhm, E.A., Schroeder, N.C., Bauer, E., Fife, J.N., Chamberlin, R.M., Abney, K.D., Young, J.S., and Jarvinen, G.D., Langmuir, 2000, vol. 16, p. 7056.
Luo, H., Lin, Q., Baber, S., and Naalla, M., J. Nanomater., 2010, Art. ID 750960, 6 pages.
Li, Y., Jia, W.-Z., Song, Y.-Y., and Xia, X.-H., Chem. Mater., 2007, vol. 19, p. 5758.
Penner, R.M. and Martin, C.R., Anal. Chem., 1987, vol. 59, p. 2625.
Thurn-Albrecht, T., Schotter, J., Kastle, G.A., Emley, N., Shibauchi, T., Krusin-Elbaum, L., Guarini, K., Black, C.T., Tuominen, M.T., and Russell, T.P., Science, 2000, vol. 290, p. 2126.
Rani, V.S., Yoon, S.S., Rao, B.P., and Kim, C.G., Mater. Chem. Phys., 2008, vol. 112, p. 1133.
Anandakumar, S. Rani, V.S., Rao, B.P., Yoon, S.S., Jeong, J.-R., and Kim, C., IEEE Trans. Magn., 2009, vol. 45, p. 4063.
Khatri, M.S., Schlorb, H., Fahler, S., Schultz, L., Nandan, B., Bohme, M., Krenek, R., and Stamm, M., Electrochim. Acta, 2009, vol. 54, p. 2536.
Elbasiony, A.M.R., Zein El Abedin, S.A., and Endres, F., J. Solid State Electrochem., 2014, vol. 18, p. 951.
Granitzer, P., Rumpf, K., Polt, P., Reichmann, A., and Krenn, H., Physica E, 2007, vol. 38, p. 205.
Herino, R., Jan, P., and Bomchil, G., J. Electrochem. Soc., 1985, vol. 132, p. 2513.
Fukami, K., Kobayashi, K., Matsumoto, T., Kawamura, Y.L., Sakka, T., and Ogata, Y.H., J. Electrochem. Soc., 2008, vol. 155, p. D443.
Fang, C., Foca, E., Xu, S., Carstensen, J., and Foll, H., J. Electrochem. Soc., 2007, vol. 154, p. D45.
Fang, C., Foca, E., Sirbu, L., Carstensen, J., Foll, H., and Tiginyanu, I.M., Phys. Stat. Sol. A, 2007, vol. 204, p. 1388.
Harraz, F.A., Kamada, K., Sasano, J., Izuo, S., Sakka, T., and Ogata, Y.H., Phys. Stat. Sol. A, 2005, vol. 202, p. 1683.
Jeske, M., Schultze, J.W., Thonissen, M., and Munder, H., Thin Solid Films, 1995, vol. 255, p. 63.
Motoyama, V., Fukunaka, Y., Ogata, Y.H., and Prinz, F.B., J. Electrochem. Soc., 2010, vol. 157, p. D357.
Chowdhury, T., Casey, D.P., and Rohan, J.F., Electrochem. Commun., 2009, vol. 11, p. 1203.
Bao, J., Tie, C., Xu, Z., Zhou, Q., Shen, D., and Ma, Q., Adv. Mater., 2001, vol. 13, p. 1631.
Cao, H., Wang, L., Qiu, Y., Wu, Q., Wang, G., Zhang, L., and Liu, X., Chem. Phys. Chem., 2006, vol. 7, p. 1500.
Tao, F., Guan, M., Jiang, Y., Zhu, J., Xu, Z., and Xue, Z., Adv. Mater., 2006, vol. 18, p. 2161.
Cheng, C.-L., Lin, J.S., and Chen, Y.-F., Mater. Lett., 2008, vol. 62, p. 1666.
Tourillon, G., Pontonnier, L., Levy, J.P., and Langlais, V., Electrochem. Solid-State Lett., 2000, vol. 3, p. 20.
Davis, D.M. and Podlaha, E.J., Electrochem. Solid-State Lett., 2005, vol. 8, p. D1.
Yoo, W.-C. and Lee, J.-K., Adv. Mater., 2004, vol. 16, p. 1097.
Wang, Q., Wang, G., Han, X., Wang, X., and Hou, J.G., J. Phys. Chem. B vol. 109, p. 23326.
Kamalakar, M.V. and Raychaudhuri, A.K., Adv. Mater., 2008, vol. 20, p. 149.
Kobayashi, K., Harraz, F.A., Izuo, S., Sakka, T., and Ogata, Y.H., J. Electrochem. Soc., 2006, vol. 153, p. C218.
Engel’gardt, G.R. and Davydov, A.D., Soviet Electrochem., 1990, vol. 26, p. 233.
Fedorov, F.S., Monch, I., Mickel, C., Tschulik, K., Zhao, B., Uhlemann, M., Gebert, A., and Eckert, J., J. Electrochem. Soc., 2013, vol. 160, p. D13.
Blondel, A., Meier, J.P., Doudin, B., and Ansermet, J.-Ph., Appl. Phys. Lett., 1994, vol. 65, p. 3019.
Evans, P.R., Yi, G., and Schwarzacher, W., Appl. Phys. Lett., 2000, vol. 76, p. 481.
Fert, A. and Piraux, L., J. Magn. Magn. Mater., 1999, vol. 200, p. 338.
Ohgai, T., Hoffer, X., Gravier, L., Wegrowe, J.-E., and Ansermet, J.-P., Nanotecnology, 2003, vol. 14, p. 978.
Piraux, L., George, J.M., Despres, J.F., Leroy, C., Ferain, E., Legras, R., Ounadjela, K., and Fert, A., Appl. Phys. Lett., 1994, vol. 65, p. 2484.
Piraux, L., Dubois, S., and Demoustier-Champagne, S., Nucl. Instrum. Methods Phys. Res., Sect. B, 1997, vol. 131, p. 357.
Dubois, S., Marchal, C., Beuken, J.M., Piraux, L., Duvail, J.L., Fert, A., George, J.M., and Maurice, J.L., Appl. Phys. Lett., 1997, vol. 70, p. 396.
Ross, C.A., Annu. Rev. Mater. Sci., 1994, vol. 24, p. 159.
Liu, K., Nagodawithana, K., Searson, P.C., and Chien, C.L., Phys. Rev. B, 1995, vol. 51, no. 7381(R).
Napol’skii, K.S., Roslyakov, I.V., Eliseev, A.A., Lukashin, A.V., and Tret’yakov, Yu.D., Al’tern. Energ. Ecol.”, 2010, no. 8, p. 79.
Pullini, D., Busquets, D., Ruotolo, A., Innocenti, G., and Amigo, V., J. Magn. Magn. Mater., 2007, vol. 316, p. e242.
Volgin, V.M. and Davydov, A.D., Russ. J. Electrochem., 2006, vol. 42, p. 567.
Burdick, J., Alonas, E., Huang, H.-C., Rege, K., and Wang, J., Nanotecnology, 2009, vol. 20, no. 6, ID 065306, 6 p.
Liu, L., Lee, W., Huang, Z., Scholz, R., and Gosele, U., Nanotecnology, 2008, vol. 19, no. 33, ID 335604, 6 p.
Kondo, T., Tanji, M., Nishio, K., and Masuda, H., Electrochem. Solid-State Lett., 2006, vol. 9, p. C189.
Kondo, T., Nishio, K., and Masuda, H., Appl. Phys. Express, 2009, vol. 2, p. 032001.
Yamauchi, Y., Nagaura, T., Ishikawa, A., Chikyow, T., and Inoue, S., J. Am. Chem. Soc., 2008, vol. 130, p. 10165.
Lee, W., Gosele, U., and Nielsch, K., Nat. Mater., 2006, vol. 5, p. 741.
Lee, W., Schwirn, K., Steinhart, M., Pippel, E., Scholz, R., and Gosele, U., Nat. Nanotechnol, 2008, vol. 3, p. 234.
Losic, D., Lillo, M., and Losic, D., Jr., Small, 2009, vol. 5, p. 1392.
Losic, D. and Losic, D., Jr., Langmuir, 2009, vol. 25, p. 5426.
Inguanta, R., Piazza, S., and Sunseri, C., Electrochem. Commun, 2008, vol. 10, p. 506.
Yu, M. and Liu, J.-H., Li, S.-M., Trans. Nonferrous Met. Soc. China, 2006, vol. 16, p. 681.
Meng, G., Jung, Y.J., Cao, A., Vajtai, R., and Ajayan, P.M., Proc. Natl. Acad. Sci. USA, 2005, vol. 102, p. 7074.
Gao, T., Meng, G., Zhang, J., Sun, S., and Zhang, L., Appl. Phys. A, 2002, vol. 74, p. 403.
Cheng, W., Steinhart, M., Gosele, U., and Wehrspohn, R.B., J. Mater. Chem., 2007, vol. 17, p. 3493.
Xu, L., Zhihao, Y., and Zhang, X., Chinese Sci. Bull., 2006, vol. 51, p. 2055.
Biswas, K.G., El Matbouly, H., Rawat, V., Schroeder, J.L., and Sands, T.D., Appl. Phys. Lett., 2009, vol. 95, p. 073108.
Spada, E.R., da Rocha, A.S., Jasinski, E.F., Pereira, G.M.C., Chavero, L.N., Oliveira, A.B., Azevedo, A., and Santorelli, M.L., J. Appl. Phys., 2008, vol. 103, p. 114306.
Kiziroglou, M.E., Li, X., Gonzalez, D.C., and de Groot, C.H., J. Appl. Phys., 2006, vol. 100, p. 113720.
Gonzalez, D.C., Kiziroglou, M.E., Li, X., Zhukov, A.A., Fangohr, H., de Groot, P.A.J., Barttlet, P.N., and de Groot, C.H., J. Magn. Magn. Mater., 2007, vol. 316.
Bartlett, P.N., Baumberg, J.J., Birkin, P.R., Ghanem, M.A., and Netti, M.C., Chem. Mater., 2002, vol. 14, p. 2199.
Hung, D., Liu, Z., Shah, N., Hao, Y., and Searson, P.C., J. Phys. Chem., vol. 111, p. 3308.
Bartlett, P.N., Birkin, P.R., and Ghanem, M.A., Chem. Commun., 2000, p. 1671.
Abdelsalam, M.E., Bartlett, P.N., Kelf, T., and Baumberg, J., Langmuir, 2005, vol. 21, p. 1753.
Xia, X.H., Tu, J.P., Zhang, J., Xiang, J.Y., Wang, X.L., and Zhao, X.B., Appl. Mater. Interfaces, 2010, vol. 2, p. 186.
Wijnhoven, J.E.G.J., Zevenhuizen, S.J.M., Hendriks, M.A., Vanmaekelbergh, D., Kelly, J.J., and Vos, W.L., Adv. Mater., 2000, vol. 12, p. 888.
Zhukov, A.A., Goncharov, A.V., de Groot, P.A.J., Ghanem, M.A., El-Hallag, I.S., Bartlett, P.N., Boardman, R., Fangohr, H., Novosad, V., and Karapetrov, G., J. Appl. Phys., 2005, vol. 97, p. 10J701.
Braun, P.V. and Wiltzius, P., Nature, 1999, vol. 402, p. 603.
Mahajan, S., Cole, R.M., Soares, B.F., Pelfrey, S.H., Russell, A.E., Baumberg, J.J., and Bartlett, P.N., J. Phys. Chem. C, 2009, vol. 113, p. 9284.
Bassetto, V.C., Russell, A.E., Kubota, L.T., and Bartlett, P.N., Electrochim. Acta, 2014, vol. 144, p. 400.
Cui, L., Mahajan, S., Cole, R.M., Soares, B., Bartlett, P.N., Baumberg, J.J., Hayward, I.P., Ren, B., Russel, A.E., and Tian, Z.Q., Phys. Chem. Chem. Phys., 2009, vol. 11, p. 1023.
Johnson, R.P., Mahajan, S., Abdelsalam, M.E., Cole, R.M., Baumberg, J.J., Russel, A.E., and Bartlett, P.N., Phys. Chem. Chem. Phys., 2011, vol. 13, p. 16661.
Baumberg, J.J., Kelf, T.A., Sugawara, Y., Cintra, S., Abdelsalam, M.E., Bartlett, P.N., and Russell, A.E., Nano Lett., 2005, vol. 5, p. 2262.
Abdelsalam, M., Bartlett, P.N., Russell, A.E., Baumberg, J.J., Cavlo, E.J., Tognalli, N.G., and Fainstein, A., Langmuir, 2008, vol. 24, p. 7018.
Sattayasamitsathit, S., Gu, Y., Kaufmann, K., Minteer, S., Polsky, R., and Wang, J., Nanoscale, 2013, vol. 2, no. 17, p. 7849.
Cherevko, S., Xing, X., and Chung, C.-H., Electrochem. Commun., 2010, vol. 12, p. 467.
Marozzi, C.A. and Chialvo, A.C., Electrochim. Acta, 2000, vol. 45, p. 2111.
Marozzi, C.A. and Chialvo, A.C., Electrochim. Acta, 2001, vol. 46, p. 861.
Qiu, H., Lu, L., Xue, L., and Huang, X., Electrochim. Acta, 2010, vol. 55, p. 6081.
Zhang, H., Ye, Y., Shen, R., Ru, C., and Hu, Y., J. Electrochem. Soc., 2013, vol. 160, p. D441.
Shin, H.-C. and Liu, M., Chem. Mater., 2004, vol. 16, p. 5460.
Nikolic, N.D., Brankovic, G., and Popov, K.I., Mater. Chem. Phys., 2011, vol. 125, p. 587.
Nikolic, N.D., Popov, K.I., Pavlovic, L.J., and Pavlovic, M.J., J. Electroanal. Chem., 2006, vol. 588, p. 88.
Wang, H., Wang, H.W., and Zeng, P., Key Eng. Mater., 2008, vols. 373–374, p. 252.
Cherevko, S. and Chung, C.-H., Electrochem. Commun., 2011, vol. 13, p. 16.
Huang, W., Wang, M., Zheng, J., and Li, Z., J. Phys. Chem. C, 2009, vol. 113, p. 1800.
Cherevko, S., Xing, X., and Chung, C.-H., Appl. Surf. Sci., 2011, vol. 257, p. 8054.
Volgin, V.M., Davydov, A.D., and Kabanova, T.B., Russ. J. Electrochem., 2012, vol. 48, p. 817.
Lopes, M.C., Oliveira, C.P., and Pereira, E.C., Electrochim. Acta, 2008, vol. 53, p. 4359.
Blanco, S., Vargas, R., Mostany, J., Borras, C., and Scharifker, B.R., J. Electrochem. Soc., 2014, vol. 161, p. E3341.
Bograchev, D.A., Volgin, V.M., and Davydov, A.D., Electrochim. Acta, 2013, vol. 96, p. 1.
Bograchev, D.A., Volgin, V.M., and Davydov, A.D., Electrochim. Acta, 2013, vol. 112, p. 279.
Bograchev, D.A., Volgin, V.M., and Davydov, A.D., Russ. J. Electrochem., 2015, vol. 51, p. 799.
Bond, A.M., Luscombe, D., Oldham, K.B., and Zoski, C.G., J. Electroanal. Chem. Interfac. Electrochem., 1988, vol. 249, p. 1.
Philippe, L., Kacem, N., and Michler, J., J. Phys. Chem. C, 2007, vol. 111, p. 5229.
Szabo, A., Cope, D.K., Tallman, D.E., Kovach, P.M., and Wightman, R.M., J. Electroanal. Chem. Interfac. Electrochem., 1987, vol. 217, p. 417.
Hariri, M.B., Dolati, A., and Moakhar, R.S., J. Electrochem. Soc., 2013, vol. 160, p. D279.
Ghahremaninezhad, A. and Dolati, A., ECS Trans., 2010, vol. 28, p. 13.
Bograchev, D.A., Volgin, V.M., and Davydov, A.D., Electrochim. Acta, 2016, vol. 207, p. 247.
Newton, M.R., Morey, K.A., Zhang, Y., Snow, R.J., Diwekar, M., Shi, J., and White, H.S., Nano Lett, 2004, vol. 4, p. 875.
Volgin, V.M., Kabanova, T.B., and Davydov, A.D., Chem. Eng. Trans., 2014, vol. 41, p. 331.
Sapoletova, N., Makarevich, T., Napolskii, K., Mishina, E., Eliseev, A., van Etteger, A., Rasingc, T., and Tsirlina, G., Phys. Chem. Chem. Phys., 2010, vol. 12, p. 15414.
Hao, Y., Zhu, F.Q., Chien, C.L., and Searson, P.C., J. Electrochem. Soc., 2007, vol. 154, p. D65.
Sumida, T., Wada, Y., Kitamura, T., and Yanagida, S., Langmuir, 2002, vol. 18, p. 3886.
Volgin, V.M., Lyubimov, V.V., Gnidina, I.V., and Davydov, A.D., Procedia CIRP, 2015, vol. 37, p. 89.
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The paper is devoted to the memory of academician V.A. Kistyakovskii (1865–1952).
Original Russian Text © A.D. Davydov, V.M. Volgin, 2016, published in Elektrokhimiya, 2016, Vol. 52, No. 9, pp. 905–933.
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Davydov, A.D., Volgin, V.M. Template electrodeposition of metals. Review. Russ J Electrochem 52, 806–831 (2016). https://doi.org/10.1134/S1023193516090020
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DOI: https://doi.org/10.1134/S1023193516090020