Nitrogen-Doped p-Type ZnO Layers Prepared with H2O Vapor-Assisted Metalorganic Molecular-Beam Epitaxy

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Copyright (c) 2002 The Japan Society of Applied Physics
, , Citation A. B. M. Almamun Ashrafi et al 2002 Jpn. J. Appl. Phys. 41 L1281 DOI 10.1143/JJAP.41.L1281

1347-4065/41/11B/L1281

Abstract

Nitrogen (N) doping in ZnO is studied to realize reproducible p-type conductivity. Undoped ZnO layers prepared on a-face of sapphire substrates with H2O vapor-assisted growth showed n-type conductivity. However, N-doped ZnO (ZnO:N) layers grown in the similar manner showed the type conversion to p-type conductivity. As-grown p-type ZnO:N layers showed low net acceptor concentrations (NAND) of ∼ 1014 cm-3, but thermal annealing of the N-doped ZnO samples as well as the optimization of growth parameters increased the NAND up to ∼ 5×1016 cm-3. Photoluminescence measurements showed consistent spectra with the electrical properties by a clear conversion from neutral donor-bound exciton emission in n-ZnO to neutral acceptor-bound exciton emission in the p-ZnO layers.

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10.1143/JJAP.41.L1281