RF-Sputtered n-p Heterojunction Diodes of ZnSe-Si and ZnSe-GaAs

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Copyright (c) 1973 The Japan Society of Applied Physics
, , Citation Kiyotaka Wasa and Shigeru Hayakawa 1973 Jpn. J. Appl. Phys. 12 408 DOI 10.1143/JJAP.12.408

1347-4065/12/3/408

Abstract

ZnSe-Si and ZnSe-GaAs n-p heterojunctions are produced by rf-sputtering of ZnSe onto single crystal wafers of Si and GaAs at 200°C. These sputtered diodes contain high resistivity ZnSe layers, and the SCLC is predominant in the forward current-voltage characteristics. Annealing the diodes in Zn vapour at 700°C for 1 hr results in the decrease of the SCLC, and the thermal emission current in series with tunneling current becomes predominant. A bias-temperature treatment of the sputtered diodes at 155°C in a forward bias condition is found to enhance their photovoltaic effects.

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10.1143/JJAP.12.408