Quantum Chemical Calculations of Sulfur Doping Reactions in Diamond CVD

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Copyright (c) 2001 The Japan Society of Applied Physics
, , Citation Hui Zhou et al 2001 Jpn. J. Appl. Phys. 40 2830 DOI 10.1143/JJAP.40.2830

1347-4065/40/4S/2830

Abstract

Recently, n-type semiconducting diamond was successfully obtained by sulfur doping using CH4/H2S/H2 plasma chemical vapor deposition (CVD). It was reported that the crystal quality too was improved by the sulfur doping. In this study, the equilibrium geometry and the band structure of S- and O-doped diamond have been investigated using density function theory (DFT) calculations. Moreover, the sulfur incorporation mechanisms have been investigated by the semi-empirical molecular orbital (MO) calculations. Our calculations revealed that the sulfur atoms are spontaneously incorporated into the diamond (100) surface, while the incorporation of the oxygen atoms is unfavorable.

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10.1143/JJAP.40.2830