Resonance Ultrasound Spectroscopy for Measuring Elastic Constants of Thin Films

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Published 28 May 2004 Copyright (c) 2004 The Japan Society of Applied Physics
, , Citation Nobutomo Nakamura et al 2004 Jpn. J. Appl. Phys. 43 3115 DOI 10.1143/JJAP.43.3115

1347-4065/43/5S/3115

Abstract

We show an advanced technique for measuring elastic constants Cij of thin films deposited on substrates. Thin films often show anisotropy between the in-plane and out-of-plane directions because of their columnar structure, residual stress, texture, and incohesive bond. Then, thin films show macroscopically transverse isotropy and have five independent Cij. All the film Cij affect free-vibration resonance frequencies of the film/substrate layered specimen. Therefore, measuring the resonance frequencies permits us to determine the thin-film Cij with the other known parameters. In order to yield reliable Cij of thin films, we have to measure the resonance frequencies with sufficient accuracy and identify vibration modes of the measured resonance frequencies. We overcome these problems by developing a tripod and using a laser-Doppler interferometer, respectively. We applied the present technique to a copper thin film. Measured Cij are smaller than those of bulk and show elastic anisotropy. We attribute these features to the incohesive bond regions.

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10.1143/JJAP.43.3115