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Over 2 A Operation at 250 °C of GaN Metal–Oxide–Semiconductor Field Effect Transistors on Sapphire Substrates

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Published 12 September 2008 Copyright (c) 2008 The Japan Society of Applied Physics
, , Citation Yuki Niiyama et al 2008 Jpn. J. Appl. Phys. 47 7128 DOI 10.1143/JJAP.47.7128

1347-4065/47/9R/7128

Abstract

We investigated normally off operation GaN metal–oxide–semiconductor field effect transistors (MOSFETs). The drain current of GaN MOSFETs with a gate width of 1 mm increased from 0.004 to 0.1 A by which the channel length decreased from 100 to 2 µm. However, the on-resistance was increased by shortening a channel length. In addition, the drain current of GaN MOSFETs with the channel length of 4 µm was increased from 0.08 A to more than 2.2 A, by which the channel width was increased from 1 to 16 mm. As a result, we achieved normally off operation GaN MOSFETs with the highest operation temperature of 250 °C. The drain current was 2.2 A at Vg=+14 V. The threshold voltage (Vth) was +3 V.

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10.1143/JJAP.47.7128