Electrical Transport Properties of p-GaN

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Copyright (c) 1996 The Japan Society of Applied Physics
, , Citation Hisashi Nakayama et al 1996 Jpn. J. Appl. Phys. 35 L282 DOI 10.1143/JJAP.35.L282

1347-4065/35/3A/L282

Abstract

Electrical transport properties of Mg-doped p-GaN grown by organometallic vapor phase epitaxy were studied between 100 and 700 K. Calculations using Fermi-Dirac statistigs were carried out, identifying the majority carrier to be holes over the whole temperature range considered. The acceptor level is 0.17 ± 0.01 eV. The hole mobility is 10 cm2/V·s and is almost temperature independent from 160 to 300 K. The detailed analysis employing Fermi-Dirac statistics was then extended to determine the temperature dependence of the Fermi level.

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10.1143/JJAP.35.L282