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Notch Model for Photoresist Dissolution

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Published 15 June 1998 • © 1998 ECS - The Electrochemical Society
, , Citation Chris A. Mack and Graham Arthur 1998 Electrochem. Solid-State Lett. 1 86 DOI 10.1149/1.1390645

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Author affiliations

1 FINLE Technologies, Austin, Texas 78716, United States of America

2 Rutherford Appleton Laboratory, Central Microstructure Facility, Chilton, Didcot, Oxon, England

Author notes

3 chris_mack@finle.com

Dates

  1. Received 31 October 1997
  2. Revised 4 May 1998
  3. Published
1944-8775/1/2/86

Abstract

A new model for photoresist dissolution rate as a function of photoactive compound concentration is presented. This semiempirical model combines elements of previous kinetic models in order to better fit recent experimental dissolution rate behavior. In particular, rate data exhibiting a dissolution notch can be well fit by this model. ©1998 The Electrochemical Society

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